Mechanistic Aspects of Initiated Chemical Vapor Deposition (iCVD) of Polymeric Thin Films

Abstract

Open access

Karen Gleason and Kenneth Lau

Meeting abstracts (Electrochemical Society), v MA2006-01(23), pp 791-791

17 Feb 2006

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https://doi.org/10.1149/ma2006-01/23/791View

Published, Version of Record (VoR)Maybe Open Access (Publisher Bronze), Open

url

https://doi.org/10.1149/MA2006-01/23/791View

Published, Version of Record (VoR) Open

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Title: Mechanistic Aspects of Initiated Chemical Vapor Deposition (iCVD) of Polymeric Thin Films
Creators: Karen Gleason
Kenneth Lau
Publication Details: Meeting abstracts (Electrochemical Society), v MA2006-01(23), pp 791-791
Publisher: Institute of Physics (IOP)
Resource Type: Abstract
Language: English
Academic Unit: Chemical and Biological Engineering
Other Identifier: 991019292231504721