Particle Surface Design by Initiated Chemical Vapor Deposition (iCVD)

Abstract

Particle Surface Design by Initiated Chemical Vapor Deposition (iCVD)

Karen Gleason and Kenneth Lau

Meeting abstracts (Electrochemical Society), v MA2006-01(8), pp 362-362

17 Feb 2006

DOI: https://doi.org/10.1149/MA2006-01/8/362

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Title: Particle Surface Design by Initiated Chemical Vapor Deposition (iCVD)
Creators: Karen Gleason
Kenneth Lau
Publication Details: Meeting abstracts (Electrochemical Society), v MA2006-01(8), pp 362-362
Publisher: Institute of Physics (IOP)
Resource Type: Abstract
Language: English
Academic Unit: Chemical and Biological Engineering
Other Identifier: 991019292127604721