Conference proceeding
Algorithm for yield driven correction of layout
2004 IEEE INTERNATIONAL SYMPOSIUM ON CIRCUITS AND SYSTEMS, VOL 5, PROCEEDINGS, pp.241-244
01 Jan 2004
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Abstract
As the development of VLSI technique, the critical dimension of IC has become smaller than the exposure wavelength. Due to the difflraction and interaction of optical waves, deformations between the image on wafer and the feature on layout are uptleniable. This results in bad performance or even invalid circuits of the chips. OPC is critical compensation technique to correct the deformations on wafer images. This paper presents a layout correction and optimization algorithm called it's a flexible and efficient core for the model-based OPC system. Since we divide the target features into different types before correction, the OPE between the target features and the environment features and the OPE between the neighboring segments of the inside feature are both considered during the correction.
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Details
- Title
- Algorithm for yield driven correction of layout
- Creators
- Y WangY C CaiX L HongQ A ZhouIEEE
- Publication Details
- 2004 IEEE INTERNATIONAL SYMPOSIUM ON CIRCUITS AND SYSTEMS, VOL 5, PROCEEDINGS, pp.241-244
- Conference
- 2004 IEEE INTERNATIONAL SYMPOSIUM ON CIRCUITS AND SYSTEMS
- Publisher
- IEEE
- Number of pages
- 4
- Resource Type
- Conference proceeding
- Language
- English
- Academic Unit
- Computer Science (Computing)
- Identifiers
- 991020638381304721
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- Web of Science research areas
- Computer Science, Artificial Intelligence
- Engineering, Electrical & Electronic