Conference proceeding
Automated health monitoring of a pulsed power system
2014 IEEE 41st International Conference on Plasma Sciences (ICOPS) held with 2014 IEEE International Conference on High-Power Particle Beams (BEAMS), pp 1-1
May 2014
Abstract
Pulsed power systems are used throughout the scientific and industrial communities, from high power microwaves to materials processing. Many of these applications involve the use of high voltage systems, where capacitors are charged in parallel and discharged in either a series or parallel configuration. For very high pulsed power systems, often is the situation whereas the charging time is relatively long (10s of seconds to minutes) compared to the discharge time (less than a millisecond). However, with the advent of high power density electrochemical storage systems, the charging time can be significantly reduced. The marked reduction in charging time can support missions requiring repeated operation without user control. Unfortunately, due to component degradation and corona/breakdown effects, the pulses may also degrade, providing less than optimal operation, or even cause catastrophic damage of the pulsed power system.
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Details
- Title
- Automated health monitoring of a pulsed power system
- Creators
- Brett M Huhman - Plasma Phys. Div., US Naval Res. Lab., Washington, DC, USAChris W Peters - Electr. Eng. Dept., Drexel Univ., Philadelphia, PA, USACarl Breuninger - Electr. Eng. Dept., Drexel Univ., Philadelphia, PA, USAJohn Carto - Electr. Eng. Dept., Drexel Univ., Philadelphia, PA, USAColin Child - Electr. Eng. Dept., Drexel Univ., Philadelphia, PA, USACharles Green - Electr. Eng. Dept., Drexel Univ., Philadelphia, PA, USAJon Stanley - Electr. Eng. Dept., Drexel Univ., Philadelphia, PA, USALamine Mili - Electr. Eng. Dept., Virginia Polytech. Inst. & State Univ., Blacksburg, VA, USA
- Publication Details
- 2014 IEEE 41st International Conference on Plasma Sciences (ICOPS) held with 2014 IEEE International Conference on High-Power Particle Beams (BEAMS), pp 1-1
- Publisher
- IEEE
- Resource Type
- Conference proceeding
- Language
- English
- Academic Unit
- Electrical and Computer Engineering
- Scopus ID
- 2-s2.0-84923040448
- Other Identifier
- 991019174303404721