Conference proceeding
Ferrofluld masking for lithographic applications
NSTI NANOTECH 2004, VOL 1, TECHNICAL PROCEEDINGS, pp.451-454
01 Jan 2004
Featured in Collection : UN Sustainable Development Goals @ Drexel
Abstract
A novel self-aligned "soft masking" method that is compatible with traditional photolithographic processes is demonstrated. This method uses a suspension of ultra-fine iron oxide grains (ferrofluid) to protect or de-protect selected areas of a magnetically patterned substrate according to a programmable sequence. Automatic mask formation and registration is controlled by ferromagnetic alignment marks patterned on a substrate. External magnetic field bias applied to the system causes ferrofluid to aggregate only over designated areas on the surface, thereby masking those areas from UV or chemical exposure.
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Details
- Title
- Ferrofluld masking for lithographic applications
- Creators
- B YellenG Friedman
- Contributors
- M Laudon (Editor)B Romanowicz (Editor)
- Publication Details
- NSTI NANOTECH 2004, VOL 1, TECHNICAL PROCEEDINGS, pp.451-454
- Conference
- NSTI NANOTECH 2004
- Publisher
- Nano Science & Technology Inst
- Number of pages
- 4
- Resource Type
- Conference proceeding
- Language
- English
- Academic Unit
- Electrical and Computer Engineering
- Identifiers
- 991019170540604721
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InCites Highlights
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- Web of Science research areas
- Biotechnology & Applied Microbiology
- Instruments & Instrumentation
- Materials Science, Multidisciplinary