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High quality GaAs/InGaAs/AlGaAs vertical-cavity surface-emitting lasers grown at a constant temperature by molecular beam epitaxy
Conference proceeding

High quality GaAs/InGaAs/AlGaAs vertical-cavity surface-emitting lasers grown at a constant temperature by molecular beam epitaxy

Z.H Zhang and C.Y Li
1996 Conference on Optoelectronic and Microelectronic Materials and Devices. Proceedings, pp 63-66
1996

Abstract

Gallium arsenide Indium gallium arsenide Molecular beam epitaxial growth Optical control Optical materials Quantum well lasers Substrates Surface emitting lasers Threshold current Vertical cavity surface emitting lasers
Low threshold current GaAs/InGaAs vertical cavity surface emitting lasers could be successfully grown by molecular beam epitaxy at a fixed substrate temperature of 560/spl deg/C which is compromised for InGaAs and AlGaAs materials, The thickness of each pair of layers in the device structures could be easily controlled using an infrared pyrometer system. Lasers with a three quantum well active region grown under such conditions show a threshold current density of 310 A cm/sup -2/ and a maximum output power of 0.8 mW from a 15/spl times/15 /spl mu/m/sup 2/ device at room temperature continuous wave operation.

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Web of Science research areas
Engineering, Electrical & Electronic
Materials Science, Multidisciplinary
Optics
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