Programmable self-aligning ferrofluid masks for lithographic applications

Conference proceeding

IEEE transactions on magnetics, v 40(4), pp 2994-2996

2004

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Magnetic properties and materials

Condensed matter: electronic structure, electrical, magnetic, and optical properties

Physics

Exact sciences and technology

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16 citations in Scopus

Title: Programmable self-aligning ferrofluid masks for lithographic applications
Creators: B. B YELLEN - Department of Electrical and Computer Engineering, Drexel University, Philadelphia, PA 19104, United States
G FRIEDMAN - Department of Electrical and Computer Engineering, Drexel University, Philadelphia, PA 19104, United States
K. A BARBEE - School of Biomedical Engineering, Drexel University, Philadelphia, PA 19104, United States
Publication Details: IEEE transactions on magnetics, v 40(4), pp 2994-2996
Conference: Ninth joint magnetism and magnetic materials-international magnetics conference (MMM-Intermag), 9th (Anaheim, California, United States, 05 Jan 2004–09 Jan 2004)
Publisher: Institute of Electrical and Electronics Engineers; New York, NY
Grant note: American Institute of Physics Institute of Electrical and Electronics Engineers (IEEE) ; Magnetics Society
Resource Type: Conference proceeding
Language: English
Academic Unit: Electrical and Computer Engineering
Web of Science ID: WOS:000223446700328
Scopus ID: 2-s2.0-4444369820
Other Identifier: 991014878364404721

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Web of Science research areas: Engineering, Electrical & Electronic; Physics, Applied