Semiconductor-metal boundaries Physics and atmospheric sciences Thin Films
Metal/semiconductor interfaces, particularly those involving Si, are of great technological and scientific interest. In atomically abrupt interfaces, many properties are determined by interatomic interactions over a few layers, i.e., over ~1 nanometer. The initial stages of growth of an atomic layer related to structural and electronic properties are thus important to thin film behavior. Surface science studies on metal-semiconductor systems often lead to contradictory conclusions regarding bonding sites and even whether the first layer is metallic or not. A key piece of information that must be consistent with any study is the number of atoms per unit area in the first layer, which is difficult to assess directly. Alkali-metal-semiconductor systems have been studied as model abrupt interfaces for several years. Novel effects, such as electron localization, were observed. Still, determinations of absolute coverage have been lacking. This dissertation describes results of absolute coverage measurements for Cs on Si(100)(2 x 1), Si(111)(7 x 7), and Si(111)(v3 x v3)R30°-B interface, this work confirms conclusions regarding electron localization effects and introduces considerations of ion beam-induced desorption for the weakly-bound Cs layer.
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Title
Absolute coverage measurements of ultrathin alkali-metal films on reconstructed silicon
Creators
Rajarshi Banerjee - DU
Contributors
Nicholas John DiNardo (Advisor) - Drexel University (1970-)
Awarding Institution
Drexel University
Degree Awarded
Doctor of Philosophy (Ph.D.)
Publisher
Drexel University; Philadelphia, Pennsylvania
Resource Type
Dissertation
Language
English
Academic Unit
College of Arts and Sciences; Physics; Drexel University
Other Identifier
20; 991014632077704721
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