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Engineering nonplanar polymer film topographies via initiated chemical vapor deposition
Dissertation   Open access

Engineering nonplanar polymer film topographies via initiated chemical vapor deposition

Zhengtao Chen
Doctor of Philosophy (Ph.D.), Drexel University
Aug 2020
DOI:
https://doi.org/10.17918/00000049
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Abstract

Polymers Chemical Vapor Deposition Thin Films
Micro/nanoscale polymer processing has drawn much attention due to a wide range of applications, like energy harvesting and storage systems, latent heat transfer, self-cleaning, microfluidic devices, micro/nanoelectromechanical systems (MEMS/NEMS), and micro/nanoelectronic devices. These applications require creating, interfacing, or integrating polymers at the micro- or nanoscale where nonplanar topographies are frequently encountered. Conventional fabrication methods usually involve complex processing with multiple steps and often use liquid solvents that can lead to issues of solvent residue, substrate damage and poor wettability. Here, we demonstrate initiated chemical vapor deposition (iCVD) as a solvent free approach that simplifies fabrication and overcomes the constraints of liquid processing through direct polymer growth on solid substrates from the monomer vapors. This thesis work focuses on making nonplanar polymer topographies through three separate iCVD pathways.

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