A VLSI compatible, multilayer planarization technique: DC magnetron sputtering using applied bias and direct substrate heating

Thesis

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A VLSI compatible, multilayer planarization technique: DC magnetron sputtering using applied bias and direct substrate heating

Mark Gregory Fissel

Master of Science (M.S.), Drexel University

1988

DOI:

https://doi.org/10.17918/00007913

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Title: A VLSI compatible, multilayer planarization technique
Creators: Mark Gregory Fissel
Awarding Institution: Drexel University
Degree Awarded: Master of Science (M.S.)
Publisher: Drexel University; Philadelphia, Pennsylvania
Number of pages: x, 125 pages
Resource Type: Thesis
Language: English
Academic Unit: Drexel University
Other Identifier: 991021888729104721