Development of low dielectric SiOF film for application in ULSI devices

Thesis

Open access

Dae Uk Moon

Master of Science (M.S.), Drexel University

1997

DOI:

https://doi.org/10.17918/00008629

Files and links (1)

pdf

Moon_Dae_199774.52 MBDownload View

7 File views/ downloads

12 Record Views

Title: Development of low dielectric SiOF film for application in ULSI devices
Creators: Dae Uk Moon
Awarding Institution: Drexel University
Degree Awarded: Master of Science (M.S.)
Publisher: Drexel University; Philadelphia, Pennsylvania
Number of pages: x, 107 pages
Resource Type: Thesis
Language: English
Academic Unit: Drexel University
Other Identifier: 991021888970504721