Journal article
Applying HWCVD to particle coatings and modeling the deposition mechanism
Thin solid films, v 516(5), pp 674-677
15 Jan 2008
Featured in Collection : UN Sustainable Development Goals @ Drexel
Abstract
A specific HWCVD variant known as initiated chemical vapor deposition or iCVD has been successfully implemented in the encapsulation of fine particles with polymers. Without using a liquid medium, iCVD enabled the coating of fine particles down to the nanoscale without particle agglomeration. More significantly, iCVD was demonstrated as a versatile surface design methodology in achieving the requisite surface properties by either directly depositing the polymer with the required functionality or through subsequent binding of the functionality on a pre-deposited reactive polymer. The ability to adapt iCVD to an increasingly wider array of substrates and polymer chemistries was aided by understanding iCVD reaction kinetics through mechanistic modeling. (C) 2007 Elsevier B.V. All rights reserved.
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Details
- Title
- Applying HWCVD to particle coatings and modeling the deposition mechanism
- Creators
- Kenneth K. S. Lau - Drexel UniversityKaren K. Gleason - Massachusetts Institute of Technology
- Publication Details
- Thin solid films, v 516(5), pp 674-677
- Publisher
- Elsevier
- Number of pages
- 4
- Resource Type
- Journal article
- Language
- English
- Academic Unit
- Chemical and Biological Engineering
- Web of Science ID
- WOS:000252285900047
- Scopus ID
- 2-s2.0-36749031656
- Other Identifier
- 991019168065204721
UN Sustainable Development Goals (SDGs)
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InCites Highlights
Data related to this publication, from InCites Benchmarking & Analytics tool:
- Collaboration types
- Domestic collaboration
- Web of Science research areas
- Materials Science, Coatings & Films
- Materials Science, Multidisciplinary
- Physics, Applied
- Physics, Condensed Matter