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Chemical and electronic properties of vapor-deposited polyaniline films on metal substrates
Journal article   Open access   Peer reviewed

Chemical and electronic properties of vapor-deposited polyaniline films on metal substrates

R.V. Plank, N.J. DiNardo and J.M. Vohs
Synthetic metals, v 89(1), pp 1-9
1997
DOI: https://doi.org/10.1016/S0379-6779(97)81186-1
url
https://doi.org/10.1016/s0379-6779(97)81186-1View
Published, Version of Record (VoR) Open CC BY-NC-ND V4.0
url
https://doi.org/10.1016/S0379-6779(97)81186-1View
Published, Version of Record (VoR) Open

Abstract

Chemical properties Chemical vapour deposition Electronic properties Films Polyaniline and derivatives
Polyaniline thin films produced by the evaporative deposition of emeraldine on Cu(110) and on evaporated Au surfaces have been characterized using high-resolution electron energy loss spectroscopy (HREELS). Ultrathin films (less than 100 Å) doped with HCl exhibited plasma frequencies in the far-IR, suggesting a high degree of ordering and electrical conductivities greater than those of HCl-doped solution-cast films. In contrast, thicker vapor-deposited films (more than 1000 Å) were found to be highly branched and have lower conductivities upon doping. These results indicate that the substrate plays a major role in determining the chemical and electronic structure of vapor-deposited polyaniline near a polymer/metal intetface. Furthermore, variations in the properties of ultrathin films grown on Au and Cu substrates suggest that interface formation is sensitive to specific interactions between the vapor-deposited polymer film and the metal substrate.

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Collaboration types
Domestic collaboration
Web of Science research areas
Materials Science, Multidisciplinary
Physics, Condensed Matter
Polymer Science
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