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Deposition and characterization of silicon dioxide thin films deposited by mercury‐arc‐source driven photon‐activated chemical‐vapor deposition
Journal article

Deposition and characterization of silicon dioxide thin films deposited by mercury‐arc‐source driven photon‐activated chemical‐vapor deposition

Kevin J. Scoles, Anderson H. Kim, Mian‐Heng Jiang and Brian C. Lee
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, v 6(1), pp 470-472
Jan 1988

Abstract

CHEMICAL VAPOR DEPOSITION ALUMINIUM PERMITTIVITY THIN FILMS VLSI ULTRAVIOLET RADIATION SILICON STRESSES VERY HIGH TEMPERATURE ELECTRIC ARCS ETCHING SILICA FILM GROWTH SiO2 BREAKDOWN HIGH TEMPERATURE

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Web of Science research areas
Engineering, Electrical & Electronic
Nanoscience & Nanotechnology
Physics, Applied
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