- Title
- Effects of RF Power on Plasma Phase Reactions and Film Structure in Deposition of a‐C:H by Styrene/Argon Discharge
- Creators
- Jung H. Lee - Department of Chemical Engineering, Drexel University, Philadelphia, Pennsylvania 19104Dong S. Kim - Department of Chemical Engineering, Drexel University, Philadelphia, Pennsylvania 19104Young H. Lee - Department of Chemical Engineering, Drexel University, Philadelphia, Pennsylvania 19104Bakhtier Farouk - Drexel University
- Publication Details
- Journal of the Electrochemical Society, v 143(4), pp 1451-1458
- Publisher
- Institute of Physics (IOP)
- Resource Type
- Journal article
- Language
- English
- Academic Unit
- Mechanical Engineering and Mechanics
- Web of Science ID
- WOS:A1996UF81500056
- Scopus ID
- 2-s2.0-0030127695
- Other Identifier
- 991019168759004721
Journal article
Effects of RF Power on Plasma Phase Reactions and Film Structure in Deposition of a‐C:H by Styrene/Argon Discharge
Journal of the Electrochemical Society, v 143(4), pp 1451-1458
01 Apr 1996
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Data related to this publication, from InCites Benchmarking & Analytics tool:
- Web of Science research areas
- Electrochemistry
- Materials Science, Coatings & Films