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Elementary processes governing V 2 AlC chemical etching in HF
Journal article   Open access   Peer reviewed

Elementary processes governing V 2 AlC chemical etching in HF

Youngsoo Kim, Athanasios Gkountaras, Odette Chaix-Pluchery, Isabelle Gélard, Johann Coraux, Claude Chapelier, Michel W Barsoum and Thierry Ouisse
RSC advances, v 10(42), pp 25266-25274
29 Jun 2020
PMID: 35517448
url
https://doi.org/10.1039/d0ra00842gView
Published, Version of Record (VoR) Open CC BY-NC V4.0
url
https://doi.org/10.1039/D0RA00842GView
Published, Version of Record (VoR) Open

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Collaboration types
Domestic collaboration
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Web of Science research areas
Chemistry, Multidisciplinary
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