Journal article
Ferrofluid lithography
Nanotechnology, v 15(10), pp S562-S565
01 Oct 2004
Featured in Collection : UN Sustainable Development Goals @ Drexel
Abstract
A novel self-aligned 'soft masking' method that is compatible with traditional photolithographic processes is demonstrated. This method uses a suspension of ultrafine iron oxide grains (ferrofluid) to protect or de-protect selected areas of a magnetically patterned substrate according to a programmable sequence. Automatic mask formation and registration is controlled by ferromagnetic alignment marks patterned on a substrate. External magnetic field bias applied to the system causes ferrofluid to aggregate only over designated areas on the surface, thereby masking those areas from UV or chemical exposure.
Metrics
Details
- Title
- Ferrofluid lithography
- Creators
- B B YellenG FridmanG Friedman
- Publication Details
- Nanotechnology, v 15(10), pp S562-S565
- Publisher
- Iop Publishing Ltd
- Number of pages
- 4
- Resource Type
- Journal article
- Language
- English
- Academic Unit
- Electrical and Computer Engineering
- Web of Science ID
- WOS:000224812200012
- Scopus ID
- 2-s2.0-7044223216
- Other Identifier
- 991019169007604721
UN Sustainable Development Goals (SDGs)
This publication has contributed to the advancement of the following goals:
InCites Highlights
Data related to this publication, from InCites Benchmarking & Analytics tool:
- Web of Science research areas
- Materials Science, Multidisciplinary
- Nanoscience & Nanotechnology
- Physics, Applied