Journal article
High pressure and high temperature in situ X-ray diffraction study on the structural stability of tantalum disilicide
Solid state communications, v 157
Mar 2013
Abstract
The structural stability in TaSi2 was investigated by in situ angle dispersive X-ray diffraction (AD-XRD), which shows that the structure is stable even up to about 50.0GPa at room temperature. However, under high pressure and high temperature (HPHT) conditions it was revealed that TaSi2 could undergo a structural phase transition from a C40-type hexagonal phase to a metastable phase after a temperature quench from 573K at 10.6GPa.
► The crystal structure is stable for C40-type TaSi2 up to 50.0GPa at room temperature. ► C40-type TaSi2 presents anisotropic compressibility behavior under high pressure. ► C40-type TaSi2 undergo a structural phase transition after a temperature quench.
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Details
- Title
- High pressure and high temperature in situ X-ray diffraction study on the structural stability of tantalum disilicide
- Creators
- C.Y. Li - Brookhaven National LaboratoryZ.H. Yu - Harbin Institute of TechnologyH.Z. Liu - Harbin Institute of TechnologyT.Q. Lü - Harbin Institute of Technology
- Publication Details
- Solid state communications, v 157
- Publisher
- Elsevier
- Resource Type
- Journal article
- Language
- English
- Academic Unit
- Materials Science and Engineering
- Web of Science ID
- WOS:000316042800001
- Scopus ID
- 2-s2.0-84874154550
- Other Identifier
- 991019196672804721
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- Collaboration types
- Domestic collaboration
- International collaboration
- Web of Science research areas
- Physics, Condensed Matter