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High resolution electron energy loss spectroscopy study of vapor deposited pyromellitic dianhydride and oxydianiline films on Cu(110)
Journal article   Open access

High resolution electron energy loss spectroscopy study of vapor deposited pyromellitic dianhydride and oxydianiline films on Cu(110)

R. V. Plank, N. J. DiNardo and J. M. Vohs
Journal of vacuum science & technology. A, Vacuum, surfaces, and films, v 14(6), pp 3174-3180
Nov 1996
url
https://doi.org/10.1116/1.580209View
Published, Version of Record (VoR)Maybe Open Access (Publisher Bronze) Open

Abstract

Cu polyimides ODA PMDA
The reaction of pyromellitic dianhydride (PMDA) and oxydianiline (ODA) on Cu(110) was studied using high resolution electron energy loss spectroscopy (HREELS). The interaction of the individual monomers with Cu(110) was also studied. PMDA dissociated on Cu(110) at 300 K forming a carboxylate link to the surface, releasing CO into the gas phase. ODA was also found to adsorb dissociatively on Cu(110) at 300 K via cleavage of one of the amine NH bonds. Vapor‐deposited PMDA/ODA films on Cu(110) reacted at 300 K to form polyamic acid. Heating a polyamic acid film to 450 K was sufficient to induce imidization and form polyimide. HREELS results indicated that the resulting polyimide chains were both bonded to the surface and terminated with PMDA monomer units. The polyimide film was stable up to 500 K, consistent with the thermal stability of PMDA on Cu(110).

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Collaboration types
Domestic collaboration
Web of Science research areas
Materials Science, Coatings & Films
Physics, Applied
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