Journal article
High resolution electron energy loss spectroscopy study of vapor deposited pyromellitic dianhydride and oxydianiline films on Cu(110)
Journal of vacuum science & technology. A, Vacuum, surfaces, and films, v 14(6), pp 3174-3180
Nov 1996
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Abstract
The reaction of pyromellitic dianhydride (PMDA) and oxydianiline (ODA) on Cu(110) was studied using high resolution electron energy loss spectroscopy (HREELS). The interaction of the individual monomers with Cu(110) was also studied. PMDA dissociated on Cu(110) at 300 K forming a carboxylate link to the surface, releasing CO into the gas phase. ODA was also found to adsorb dissociatively on Cu(110) at 300 K via cleavage of one of the amine NH bonds. Vapor‐deposited PMDA/ODA films on Cu(110) reacted at 300 K to form polyamic acid. Heating a polyamic acid film to 450 K was sufficient to induce imidization and form polyimide. HREELS results indicated that the resulting polyimide chains were both bonded to the surface and terminated with PMDA monomer units. The polyimide film was stable up to 500 K, consistent with the thermal stability of PMDA on Cu(110).
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Details
- Title
- High resolution electron energy loss spectroscopy study of vapor deposited pyromellitic dianhydride and oxydianiline films on Cu(110)
- Creators
- R. V. Plank - Department of Chemical Engineering, University of Pennsylvania, Philadelphia, Pennsylvania 19104N. J. DiNardo - University of PennsylvaniaJ. M. Vohs - Department of Chemical Engineering, University of Pennsylvania, Philadelphia, Pennsylvania 19104
- Publication Details
- Journal of vacuum science & technology. A, Vacuum, surfaces, and films, v 14(6), pp 3174-3180
- Number of pages
- 7
- Resource Type
- Journal article
- Language
- English
- Academic Unit
- Physics
- Web of Science ID
- WOS:A1996VV24700028
- Scopus ID
- 2-s2.0-0030519677
- Other Identifier
- 991019167626504721
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- Collaboration types
- Domestic collaboration
- Web of Science research areas
- Materials Science, Coatings & Films
- Physics, Applied