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Initiated chemical vapor deposition (iCVD) of polymeric nanocoatings
Journal article   Peer reviewed

Initiated chemical vapor deposition (iCVD) of polymeric nanocoatings

Tyler P Martin, Kenneth K.S Lau, Kelvin Chan, Yu Mao, Malancha Gupta, W Shannan O'Shaughnessy and Karen K Gleason
Surface & coatings technology, v 201(22), pp 9400-9405
2007

Abstract

Antimicrobial plasma Polymerization Polymer coating Polymer thin film Chemical vapor deposition HWCVD
Initiated chemical vapor deposition of polymers (iCVD) is a process similar to hot-wire CVD (HWCVD) in which a free-radical initiating species is employed to greatly increase the growth rate while decreasing the required energy input. In general, iCVD allows for the deposition of linear polymer, copolymer and/or crosslinked films with a wide range of functions. Surveyed examples include antimicrobial, superhydrophobic, superhydrophilic, and other functional thin polymer films and coatings.

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Web of Science research areas
Materials Science, Coatings & Films
Physics, Applied
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