Journal article
Initiated chemical vapor deposition (iCVD) of copolymer thin films
Thin solid films, v 516(5), pp 678-680
15 Jan 2008
Featured in Collection : UN Sustainable Development Goals @ Drexel
Abstract
Initiated chemical vapor deposition (iCVD) represents a novel bot-wire CVD variant for producing copolymer thin films. iCVD copolymerization was characterized by a conventional liquid-phase free radical copolymerization equation when applied to methacrylic acid copolymers. FTIR peak shifts with changing comonomer ratios in the copolymers further supported a copolymerization mechanism. Crosslinked methacrylic acid copolymers provided pH-dependent swelling behavior that enabled an enteric release of active core material when the copolymer was used as an encapsulation coating. (C) 2007 Elsevier B.V. All rights reserved.
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Details
- Title
- Initiated chemical vapor deposition (iCVD) of copolymer thin films
- Creators
- Kenneth K. S. Lau - Massachusetts Institute of TechnologyKaren K. Gleason - Massachusetts Institute of Technology
- Publication Details
- Thin solid films, v 516(5), pp 678-680
- Publisher
- Elsevier
- Number of pages
- 3
- Resource Type
- Journal article
- Language
- English
- Academic Unit
- Chemical and Biological Engineering
- Web of Science ID
- WOS:000252285900048
- Scopus ID
- 2-s2.0-36749059458
- Other Identifier
- 991019168271704721
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InCites Highlights
Data related to this publication, from InCites Benchmarking & Analytics tool:
- Collaboration types
- Domestic collaboration
- Web of Science research areas
- Materials Science, Coatings & Films
- Materials Science, Multidisciplinary
- Physics, Applied
- Physics, Condensed Matter