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Investigation of the liquid metal ion source cluster beam constituents and their role in the properties of the deposited film
Journal article   Open access

Investigation of the liquid metal ion source cluster beam constituents and their role in the properties of the deposited film

M. François, K. Pourrezaei, A. Bahasadri and D. Nayak
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, v 5(1), pp 178-183
Jan 1987
url
https://doi.org/10.1116/1.583858View
Published, Version of Record (VoR)Maybe Open Access (Publisher Bronze) Open

Abstract

AUGER ELECTRON SPECTROSCOPY ADHESION GOLD Au CLUSTER BEAMS SILICON ION SOURCES ETCHING ION COLLISIONS ATOMIC CLUSTERS GOLD IONS MORPHOLOGY
A transverse magnetic field has been used to separate ion cluster beam constituents according to their charge to mass ratio. As a result, several circular spots were observed on a silicon wafer at a distance of 160 mm from the source. The charge to mass ratio of each spot was identified based on its location. The current profile of each spot as a function of total beam current was measured. The results indicate that for the source structure used in this study, clusters are present along the axis of the beam, even at 60 μA current. However, their relative abundance is significantly increased as current is increased. The Auger electron spectroscopy of each spot confirms that the large clusters are the necessary species for film deposition. No significant deposition was observed for the Au+ +, Au+, Au+ 2, etc., due to sputter etching. The deposited film is due to large clusters, which in the absence of energetic ions shows cornflake type morphology as opposed to granular morphology observed in the presence of energetic ions. The film deposited in the presence of energetic ions shows excellent adhesion to the substrate and overall integrity. However, the film deposited in the absence of energetic ion does not have sufficient film integrity.

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Web of Science research areas
Engineering, Electrical & Electronic
Nanoscience & Nanotechnology
Physics, Applied
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