Low dielectric fluorinated amorphous carbon thin films grown from C6F6 and Ar plasma

Journal article

Peer reviewed

Jeong W YI, Young H Lee and Bakhtier Farouk

Thin solid films, v 374(1), pp 103-108

2000

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Condensed matter: electronic structure, electrical, magnetic, and optical properties

Cross-disciplinary physics: materials science; rheology

Dielectric properties of solids and liquids

Dielectrics, piezoelectrics, and ferroelectrics and their properties

Exact sciences and technology

Ion and electron beam-assisted deposition; ion plating

Materials science

Methods of deposition of films and coatings; film growth and epitaxy

Optical constants (including refractive index, complex dielectric constant, absorption, reflection and transmission coefficients, emissivity)

Optical constants: refractive index, complex dielectric constant, absorption, reflection and transmission coefficients, emissivity

Optical properties and condensed-matter spectroscopy and other interactions of matter with particles and radiation

Optical properties of bulk materials and thin films

Permittivity (dielectric function)

Physics

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79 citations in Scopus

Title: Low dielectric fluorinated amorphous carbon thin films grown from C6F6 and Ar plasma
Creators: Jeong W YI - Drexel University
Young H Lee - Drexel University
Bakhtier Farouk - Drexel University
Publication Details: Thin solid films, v 374(1), pp 103-108
Publisher: Elsevier Science
Resource Type: Journal article
Language: English
Academic Unit: Mechanical Engineering and Mechanics
Web of Science ID: WOS:000090121800015
Scopus ID: 2-s2.0-0034291493
Other Identifier: 991019169909604721

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Web of Science research areas: Materials Science, Coatings & Films; Materials Science, Multidisciplinary; Physics, Applied; Physics, Condensed Matter