Journal article
Particle simulation of radio-frequency plasma discharges of methane for carbon film deposition
IEEE transactions on plasma science, v 26(2), pp 125-134
01 Apr 1998
Featured in Collection : UN Sustainable Development Goals @ Drexel
Abstract
Particle-in-cell/Monte Carlo (PIC/MC) simulations of capacitively coupled radio-frequency (RF) glow discharges were carried out for low pressure CH4 plasmas. The present computational scheme includes the motions and collisions of both neutral and charged particles. The CH4 plasma is modeled by combining a one-dimensional PIC/MC method with a polyatomic particle collision scheme. The model considers the motions of CH4, CH+4, CH3, C2H5, H2, H, and electrons.
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Details
- Title
- Particle simulation of radio-frequency plasma discharges of methane for carbon film deposition
- Creators
- Katsuya Nagayama - Sumitomo ChemicalBakhtier Farouk - Drexel UniversityYoung Lee - Drexel University
- Publication Details
- IEEE transactions on plasma science, v 26(2), pp 125-134
- Publisher
- The Institute of Electrical and Electronics Engineers, Inc. (IEEE)
- Resource Type
- Journal article
- Language
- English
- Academic Unit
- Mechanical Engineering and Mechanics
- Web of Science ID
- WOS:000073495500001
- Scopus ID
- 2-s2.0-0032049144
- Other Identifier
- 991019169516904721
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- Collaboration types
- Industry collaboration
- Domestic collaboration
- International collaboration
- Web of Science research areas
- Physics, Fluids & Plasmas