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Particle simulation of radio-frequency plasma discharges of methane for carbon film deposition
Journal article   Peer reviewed

Particle simulation of radio-frequency plasma discharges of methane for carbon film deposition

Katsuya Nagayama, Bakhtier Farouk and Young Lee
IEEE transactions on plasma science, v 26(2), pp 125-134
01 Apr 1998

Abstract

Carbon Plasma Simulation
Particle-in-cell/Monte Carlo (PIC/MC) simulations of capacitively coupled radio-frequency (RF) glow discharges were carried out for low pressure CH4 plasmas. The present computational scheme includes the motions and collisions of both neutral and charged particles. The CH4 plasma is modeled by combining a one-dimensional PIC/MC method with a polyatomic particle collision scheme. The model considers the motions of CH4, CH+4, CH3, C2H5, H2, H, and electrons.

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Collaboration types
Industry collaboration
Domestic collaboration
International collaboration
Web of Science research areas
Physics, Fluids & Plasmas
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