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Journal article
Radio-frequency plasma cleaning for mitigation of high-power microwave-pulse shortening in a coaxial gyrotron
Applied physics letters, v 77(23), pp 3725-3727
04 Dec 2000
Abstract
Results are reported demonstrating that radio-frequency (rf) plasma cleaning is an effective technique for mitigating microwave-pulse shortening (i.e., lengthening the pulse) in a multimegawatt, large-orbit, coaxial gyrotron. Cleaning plasmas were generated by 50 W of rf power at 13.56 MHz in nitrogen fill gas in the pressure range 15–25 mTorr. Improvements in the averaged microwave energy output of this high-power-microwave device ranged from 15% to 245% for different initial conditions and cleaning protocols. The mechanism for this improvement is believed to be rf plasma sputtering of excess water vapor from the cavity/waveguide and subsequent removal of the contaminant by cryogenic vacuum pumps.
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Details
- Title
- Radio-frequency plasma cleaning for mitigation of high-power microwave-pulse shortening in a coaxial gyrotron
- Creators
- William E. Cohen - University of Michigan–Ann ArborRonald M. Gilgenbach - University of Michigan–Ann ArborReginald L. Jaynes - University of Michigan–Ann ArborChristopher W. Peters - University of Michigan–Ann ArborMike R. Lopez - University of Michigan–Ann ArborY. Y. Lau - University of Michigan–Ann ArborScott A. Anderson - University of Michigan–Ann ArborMary L. Brake - University of Michigan–Ann ArborThomas A. Spencer
- Publication Details
- Applied physics letters, v 77(23), pp 3725-3727
- Publisher
- American Institute of Physics (AIP)
- Number of pages
- 3
- Resource Type
- Journal article
- Language
- English
- Academic Unit
- Electrical and Computer Engineering
- Web of Science ID
- WOS:000165584700015
- Scopus ID
- 2-s2.0-0000842631
- Other Identifier
- 991021957273804721
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- Collaboration types
- Industry collaboration
- Domestic collaboration
- Web of Science research areas
- Physics, Applied