Radio-frequency plasma cleaning for mitigation of high-power microwave-pulse shortening in a coaxial gyrotron
William E. Cohen, Ronald M. Gilgenbach, Reginald L. Jaynes, Christopher W. Peters, Mike R. Lopez, Y. Y. Lau, Scott A. Anderson, Mary L. Brake and Thomas A. Spencer
Results are reported demonstrating that radio-frequency (rf) plasma cleaning is an effective technique for mitigating microwave-pulse shortening (i.e., lengthening the pulse) in a multimegawatt, large-orbit, coaxial gyrotron. Cleaning plasmas were generated by 50 W of rf power at 13.56 MHz in nitrogen fill gas in the pressure range 15–25 mTorr. Improvements in the averaged microwave energy output of this high-power-microwave device ranged from 15% to 245% for different initial conditions and cleaning protocols. The mechanism for this improvement is believed to be rf plasma sputtering of excess water vapor from the cavity/waveguide and subsequent removal of the contaminant by cryogenic vacuum pumps.