Raman microspectroscopy study of processing-induced phase transformations and residual stress in silicon (vol 14, pg 936, 1999)

Journal article

Peer reviewed

Y Gogotsi, C Baek and F Kirscht

Semiconductor science and technology, v 14(11), pp 1019-1019

01 Nov 1999

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Title: Raman microspectroscopy study of processing-induced phase transformations and residual stress in silicon (vol 14, pg 936, 1999)
Creators: Y Gogotsi
C Baek
F Kirscht
Publication Details: Semiconductor science and technology, v 14(11), pp 1019-1019
Publisher: Iop Publishing Ltd
Number of pages: 1
Resource Type: Journal article
Language: English
Academic Unit: Materials Science and Engineering
Web of Science ID: WOS:000083630700017
Other Identifier: 991019186634604721

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Web of Science research areas: Engineering, Electrical & Electronic; Materials Science, Multidisciplinary; Physics, Condensed Matter