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Room temperature deposition of superconducting niobium nitride films by ion beam assisted sputtering
Journal article   Open access   Peer reviewed

Room temperature deposition of superconducting niobium nitride films by ion beam assisted sputtering

Tomas Polakovic, Sergi Lendinez, John E. Pearson, Axel Hoffmann, Volodymyr Yefremenko, Clarence L. Chang, Whitney Armstrong, Kawtar Hafidi, Goran Karapetrov, Valentine Novosad, …
APL materials, v 6(7), pp 76107-076107-9
01 Jul 2018
url
https://doi.org/10.1063/1.5031904View
Published, Version of Record (VoR)CC BY V4.0 Open

Abstract

Materials Science Materials Science, Multidisciplinary Nanoscience & Nanotechnology Physical Sciences Physics Physics, Applied Science & Technology Science & Technology - Other Topics Technology
We use room temperature ion beam assisted sputtering to deposit niobium nitride thin films. Electrical and structural characterizations were performed by electric transport and magnetization measurements at variable temperatures, X-ray diffraction, and atomic force microscopy. Compared to reactive sputtering of niobium nitride, films sputtered in the presence of an ion beam show a remarkable increase in the superconducting critical temperature T-c, while exhibiting lower sensitivity to nitrogen concentration during deposition. Thickness dependence of the superconducting critical temperature is comparable to films prepared by conventional methods at high substrate temperatures and is consistent with behavior driven by quantum size effects or weak localization. (C) 2018 Author(s). All article content, except where otherwise noted, is licensed under a Creative Commons Attribution (CC BY) license.

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Domestic collaboration
Web of Science research areas
Materials Science, Multidisciplinary
Nanoscience & Nanotechnology
Physics, Applied
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