Simulation of thin carbon film deposition in a radio-frequency methane plasma reactor

Journal article

K Bera, B Farouk and Y. H Lee

Journal of the Electrochemical Society, v 146(9), pp 3264-3269

1999

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Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.)

Cross-disciplinary physics: materials science; rheology

Exact sciences and technology

Materials science

Methods of deposition of films and coatings; film growth and epitaxy

Physics

Physics of gases, plasmas and electric discharges

Physics of plasmas and electric discharges

Plasma applications

Theory and models of film growth

4 Record Views

13 citations in Scopus

Title: Simulation of thin carbon film deposition in a radio-frequency methane plasma reactor
Creators: K Bera - Department of Mechanical Engineering and Mechanics
B Farouk - Drexel University
Y. H Lee - Drexel University
Publication Details: Journal of the Electrochemical Society, v 146(9), pp 3264-3269
Publisher: Electrochemical Society
Resource Type: Journal article
Language: English
Academic Unit: Mechanical Engineering and Mechanics
Web of Science ID: WOS:000082607600020
Scopus ID: 2-s2.0-0033360166
Other Identifier: 991019168384204721

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Web of Science research areas: Electrochemistry; Materials Science, Coatings & Films