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The corrosion behavior of Ti 3SiC 2 in common acids and dilute NaOH
Journal article   Peer reviewed

The corrosion behavior of Ti 3SiC 2 in common acids and dilute NaOH

J. Travaglini, M.W. Barsoum, V. Jovic and T. El-Raghy
Corrosion science, v 45(6), pp 1313-1327
2003
DOI: https://doi.org/10.1016/S0010-938X(02)00227-5

Abstract

Hot isostatically processed bulk, fine (3–5 μm) grained samples of Ti 3SiC 2 were immersed in concentrated and dilute hydrochloric, HCl, sulphuric, H 2SO 4, nitric, HNO 3, dilute hydrofluoric, HF, acids and sodium hydroxide, NaOH, solutions at room temperature. Based on six-months weight changes the dissolution rates of Ti 3SiC 2 in concentrated and dilute HCl, H 2SO 4 and dilute NaOH were found to be negligible (<2 μm/yr). In dilute HF and concentrated HNO 3 the corrosion rates were, respectively, ≈5 μm/yr and 13 μm/yr respectively. In contrast to Ti metal, the weight losses of Ti 3SiC 2 in dilute HNO 3 were higher (≈250–320 μm/yr) and depended on concentration. Post-immersion scanning electron microscopic micrographs of samples immersed in HNO 3 indicated that an oxygen rich Si-based layer forms on the surface of the samples. This implies that the Ti atoms are leached out into the HNO 3 solution, leaving behind a Si-rich layer that is ultimately oxidized. Cyclic polarization and potentiostatic i– t transients in dilute HCl and H 2SO 4 acids, strongly suggest that a thin irreversible electrically insulating layer forms on the surface of Ti 3SiC 2. Exposing a sample to a constant current density of 0.6 mA/cm 2 for two days resulted in the formation of a 5 μm thick SiO 2-based layer on the surface. The presence of such a layer would explain the excellent corrosion resistance of Ti 3SiC 2 in these acids.

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Materials Science, Multidisciplinary
Metallurgy & Metallurgical Engineering
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