Three-dimensional predictions of silicon deposition in a barrel type CVD reactor

Journal article

L Yang, B Farouk and R. L Mahajan

Journal of the Electrochemical Society, v 139(9), pp 2666-2673

1992

Additional Links

Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.)

Cross-disciplinary physics: materials science; rheology

Exact sciences and technology

Materials science

Methods of deposition of films and coatings; film growth and epitaxy

Physics

18 Record Views

18 citations in Scopus

Title: Three-dimensional predictions of silicon deposition in a barrel type CVD reactor
Creators: L Yang - Drexel univ., mechanical eng. mechanics dep., Philadelphia PA 19104, United States
B Farouk - Drexel University
R. L Mahajan - Drexel univ., mechanical eng. mechanics dep., Philadelphia PA 19104, United States
Publication Details: Journal of the Electrochemical Society, v 139(9), pp 2666-2673
Publisher: Electrochemical Society
Resource Type: Journal article
Language: English
Academic Unit: Mechanical Engineering and Mechanics
Web of Science ID: WOS:A1992JL82500058
Scopus ID: 2-s2.0-0026915579
Other Identifier: 991019173829504721

Data related to this publication, from InCites Benchmarking & Analytics tool:

Collaboration types: Industry collaboration; Domestic collaboration
Web of Science research areas: Electrochemistry; Materials Science, Coatings & Films