Growth and In Situ Characterization of Oxide Epitaxial Heterostructures with Atomic Plane Precision

Journal article

Open access

Peer reviewed

Q. He, S. Jesse, A.R. Lupini, M. Fuentes-Cabrera, B.G. Sumpter, A. Akbashev, M. Falmbigl, J. Spanier, S. V. Kalinin and A.Y. Borisevich

Microscopy and microanalysis, v 22(S3), pp 1504-1505

Jul 2016

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https://doi.org/10.1017/s1431927616008369View

Published, Version of Record (VoR)Maybe Open Access (Publisher Bronze), Open

Microscopy for Thin Films of Metals, Semiconductors and Insulators

Physical Science Symposia

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Title: Growth and In Situ Characterization of Oxide Epitaxial Heterostructures with Atomic Plane Precision
Creators: Q. He - Materials Sciences and Technology Division, Oak Ridge National Laboratory, Oak Ridge, TN
S. Jesse - The Center for Nanophase Materials Science, Oak Ridge National Laboratory, Oak Ridge, TN
A.R. Lupini - Materials Sciences and Technology Division, Oak Ridge National Laboratory, Oak Ridge, TN
M. Fuentes-Cabrera - The Center for Nanophase Materials Science, Oak Ridge National Laboratory, Oak Ridge, TN
B.G. Sumpter - The Center for Nanophase Materials Science, Oak Ridge National Laboratory, Oak Ridge, TN
A. Akbashev - Department of Materials Science and Engineering, Drexel University, Philadelphia, PA
M. Falmbigl - Department of Materials Science and Engineering, Drexel University, Philadelphia, PA
J. Spanier - Drexel University
S. V. Kalinin - The Center for Nanophase Materials Science, Oak Ridge National Laboratory, Oak Ridge, TN
A.Y. Borisevich - Materials Sciences and Technology Division, Oak Ridge National Laboratory, Oak Ridge, TN
Publication Details: Microscopy and microanalysis, v 22(S3), pp 1504-1505
Publisher: Cambridge University Press
Number of pages: 2
Resource Type: Journal article
Language: English
Academic Unit: Mechanical Engineering and Mechanics
Other Identifier: 991019231632504721