Journal article
LaAlO3/SrTiO3 Epitaxial Heterostructures by Atomic Layer Deposition
Journal of electronic materials, v 41(5), pp 819-823
01 May 2012
Featured in Collection : UN Sustainable Development Goals @ Drexel
Abstract
Thin films of LaAlO3 were deposited on TiO2-terminated (100) SrTiO3 crystals by atomic layer deposition (ALD), using tris(iso-propylcyclopentadienyl)lanthanum and trimethyl aluminum precursors. Water was used as the oxidizer. The film composition was shown to be controlled by the ratio of La/Al precursor pulses during ALD, with near-stoichiometric LaAlO3 resulting at precursor pulse ratios of 4/1 to 5/1. Films near the stoichiometric LaAlO3 composition were shown to crystallize on subsequent annealing to form epitaxial LaAlO3/SrTiO3 heterostructures. Electrical characterization of these structures was done by two-terminal direct-current (DC) current-voltage scans at room temperature and under high-vacuum conditions. The results show electrical conductivity for the ALD-deposited epitaxial LaAlO3/SrTiO3 heterostructures, which turns on for thickness above four unit cells for the LaAlO3 film.
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Details
- Title
- LaAlO3/SrTiO3 Epitaxial Heterostructures by Atomic Layer Deposition
- Creators
- Nick M. Sbrockey - Structured Materials IndustriesMichael Luong - Structured Materials IndustriesEric M. Gallo - Drexel UniversityJennifer D. Sloppy - Drexel UniversityGuannan Chen - Drexel UniversityChristopher R. Winkler - Drexel UniversityStephanie H. Johnson - Drexel UniversityMitra L. Taheri - Drexel UniversityGary S. Tompa - Structured Materials IndustriesJonathan E. Spanier - Drexel University
- Publication Details
- Journal of electronic materials, v 41(5), pp 819-823
- Publisher
- Springer Nature
- Number of pages
- 5
- Grant note
- W911NF-08-1-0067 / ARO NTI/BFTP DMR-0722845 / NSF under an MRI FA9550-09-C-0163; FA9550-10-C-0163 / AFOSR; United States Department of Defense; Air Force Office of Scientific Research (AFOSR)
- Resource Type
- Journal article
- Language
- English
- Academic Unit
- Mechanical Engineering and Mechanics
- Web of Science ID
- WOS:000303495000004
- Scopus ID
- 2-s2.0-84862813663
- Other Identifier
- 991019169565904721
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InCites Highlights
Data related to this publication, from InCites Benchmarking & Analytics tool:
- Web of Science research areas
- Engineering, Electrical & Electronic
- Materials Science, Multidisciplinary
- Physics, Applied