Journal article
Microreactor for High-Yield Chemical Bath Deposition of Semiconductor Nanowires: ZnO Nanowire Case Study
Industrial & engineering chemistry research, v 48(13), pp 5954-5961
01 Jul 2009
Abstract
We report on the design of a batch microreactor for depositing oxide and chalcogenide nanowires and thin films onto a substrate from solution, and we demonstrate its utility using ZnO nanowire deposition as a case study. A contact-heated substrate forms one wall of a submillimeter reaction channel, and the short mass-transport length results in high-yield deposition on the substrate with minimal loss to precipitation or deposition on other unheated reactor walls. The microreactor's low thermal mass enables rapid heating, which reduces the induction time and increases the deposition rate. The microreactor was used to grow dense arrays of well-aligned single-crystal ZnO nanowires with diameters of 80-100 nm and yields of 35%-50%. Deposition rates are faster, yields are an order of magnitude higher, and ZnO defect densities are equivalent to those using a conventional chemical bath deposition reactor with the same chemistry. The species that limit deposition rates are identified.
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Details
- Title
- Microreactor for High-Yield Chemical Bath Deposition of Semiconductor Nanowires: ZnO Nanowire Case Study
- Creators
- Kevin M. McPeak - Drexel UniversityJason B. Baxter - Drexel University
- Publication Details
- Industrial & engineering chemistry research, v 48(13), pp 5954-5961
- Publisher
- American Chemical Society; Washington, DC
- Number of pages
- 8
- Resource Type
- Journal article
- Language
- English
- Academic Unit
- Chemical and Biological Engineering
- Web of Science ID
- WOS:000267379300005
- Scopus ID
- 2-s2.0-67650841612
- Other Identifier
- 991019168546504721
InCites Highlights
Data related to this publication, from InCites Benchmarking & Analytics tool:
- Web of Science research areas
- Engineering, Chemical