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Oxidative chemical vapor deposition of polyaniline thin films
Journal article   Open access   Peer reviewed

Oxidative chemical vapor deposition of polyaniline thin films

Yuriy Y Smolin, Masoud Soroush and Kenneth K S Lau
Beilstein journal of nanotechnology, v 8(1), pp 1266-1276
16 Jun 2017
PMID: 28685127
url
https://doi.org/10.3762/bjnano.8.128View
Published, Version of Record (VoR) Open

Abstract

Nanoscience oxidative chemical vapor deposition thin film processing conducting polymers Full Research Paper polyaniline Nanotechnology emeraldine oxidation state
Polyaniline (PANI) is synthesized via oxidative chemical vapor deposition (oCVD) using aniline as monomer and antimony pentachloride as oxidant. Microscopy and spectroscopy indicate that oCVD processing conditions influence the PANI film chemistry, oxidation, and doping level. Fourier transform infrared spectroscopy (FTIR), scanning electron microscopy (SEM), and X-ray photoelectron spectroscopy (XPS) indicate that a substrate temperature of 90 °C is needed to minimize the formation of oligomers during polymerization. Lower substrate temperatures, such as 25 °C, lead to a film that mostly includes oligomers. Increasing the oxidant flowrate to nearly match the monomer flowrate favors the deposition of PANI in the emeraldine state, and varying the oxidant flowrate can directly influence the oxidation state of PANI. Changing the reactor pressure from 700 to 35 mTorr does not have a significant effect on the deposited film chemistry, indicating that the oCVD PANI process is not concentration dependent. This work shows that oCVD can be used for depositing PANI and for effectively controlling the chemical state of PANI.

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Web of Science research areas
Materials Science, Multidisciplinary
Nanoscience & Nanotechnology
Physics, Applied
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